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Metallographic Abrasive Blades - These high quality Abrasive Cutting Blades are compatible with competitive metallographic cutters. Special order blades can also be obtained for larger diameter cutting blades (16" and 20"). Metallographic Abrasive blade cutting guidelines |
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Metallographic Wafering Blades - PACE Technologies offers diamond wafering blades for cutting extremely brittle microelectronics to extremely hard ceramics. The diamond blades vary in diamond grit size, concentration, and blade size. Metallographic Wafering blade cutting guidelines |
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Metallographic Compression Mounting Resins are specifically designed for mounting at elevated temperatures and pressures in compression mounting presses. Typical compression mounting resins include thermoplastics (clear acrylics) and thermosetting resins (phenolics, epoxies and diallyl phthalates). |
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Metallographic Castable Mounting Resins or cold mounting resins are room temperature mounting resins which typically require at least two parts (resin and hardener). Castable mounting is the preferred mounting technique for brittle materials such as microelectronics. Metallographic Castable mounting guidelines |
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Metallographic Grinding Papers |
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Metallographic Composite Disks |
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Metallographic Lapping films |
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Metallographic Polishing Pads |
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Metallographic Diamond Abrasives |
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Metallographic Nanometer alumina is a colliodal alumina produced by a proprietary process which significantly improves the particle size distribution and increases the hardness of the alumina particles. Thus nanometer alumina is the ideal polishing abrasive for a wide range of metals and composites. |
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Metallographic Collodial silica and CMP sluries are relatively soft abrasives with a high chemical activity. They are ideal chemical mechanical polishing abrasive (CMP). The combination of chemical polishing with mechanical polishing increases polishing rates and improves surface finishes. It is the ideal abrasive for polishing ceramics. Combinations of colloidal silica with the polycrystalline alumina (CMP slurry) or diamond slurries have also been very successful for the intermediate polishing steps for ceramics and ceramic composites. |
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Metallographic Cleaning - Prior to microstructural examination residual abrasives and lubricants must be removed. Proper cleaning and drying techniques improve the final micrographs and thus improve qualitative and quantitative examination of the specimen surface. |
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Metallographic Etching - To aid in the analysis of a materials microsctructure, etching is often used to bring out or highlight specific features. |
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Metallographic Hardness Testing |














