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Graphite

Non-metal

Basic Information

Category: Non-metal
Material Type: non-metal
Alternative Names:
Carbon GraphiteSynthetic GraphiteNatural Graphite
Tags:
friablebrittleelectrodenuclearcarbon

Composition & Structure

Composition: Pure carbon (hexagonal crystal structure, sp² bonded layers)
Microstructure: Layered hexagonal crystalline carbon with basal plane cleavage

Description

Graphite is a crystalline allotrope of carbon with a layered hexagonal structure. It is soft, friable, and electrically conductive along the basal planes. Used in electrodes, nuclear reactor moderators, crucibles, battery anodes, and mechanical seals. Preparation is challenging due to extreme friability — particles pull out easily creating artifacts confused with porosity.

Mechanical Properties

Hardness: 7-11 HV (extremely soft)
Hardness (HV): 7-11 HV
Hardness Category: very soft
Tensile Strength: 10-40 MPa

Physical Properties

Density: 1.5-2.3 g/cm³
Melting Point: Sublimes ~3650°C

Material Characteristics

Work Hardening: No
Magnetic: No
Corrosion Resistance: excellent

Sectioning

Diamond wafering blade - fine grit / low concentration. Very low feed rate. Abrasive cut-off wheels cause catastrophic fracture.

Mounting

Castable with epoxy. Vacuum impregnation strongly recommended. Hot compression acceptable for dense grades.

Grinding

Start at 240 grit SiC minimum. Light pressure (10-15 N). Never use coarser grits.

Grinding sequence:
  • 240 grit: Planar grinding
  • 360 grit: 1 min
  • 600 grit: 1 min
  • 800 grit: 1 min
  • 1200 grit: 1 min
Recommended Sequence:
240 SiC360 SiC600 SiC800 SiC1200 SiC

Polishing

Polishing sequence:
  • 1μm diamond: on ATLANTIS pad with SIAMAT colloidal silica (2 min)
  • 0.05μm alumina: on NAPPAD with DIALUBE Purple (30 sec)
Recommended Sequence:
1μm diamond0.05μm alumina

Etching

Examined as-polished. Polarized light reveals crystallographic orientation through optical anisotropy. Crossed polarizers show color contrast between grains. Thermal etching (1000-1200°C) for grain boundaries if needed.
Common Etchants:
As-polished (polarized light)Thermal etching

Heat Treatment

Manufactured through baking (carbonization) at ~1000°C and graphitization at 2500-3000°C. Not heat treated in service.

Applicable Standards

  • ASTM C709
  • ASTM C559
  • ASTM C769

Applications

  • Electrodes
  • Nuclear reactor moderators
  • Crucibles and molds
  • Mechanical seals

Typical Uses

  • Electric arc furnace electrodes
  • Battery anodes
  • Rocket nozzle throats
  • Semiconductor processing fixtures
  • Carbon brushes