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SiSiC (Reaction-Bonded Silicon Carbide)

Ceramic

Basic Information

Category: Ceramic
Material Type: ceramic
Alternative Names:
Reaction-Bonded SiCRBSCSilicon-Infiltrated SiCSiSiC
Tags:
engineering-ceramicwear-resistantpump-sealheat-exchanger

Composition & Structure

Composition: SiC grains bonded by free silicon (~8-15% free Si)
Microstructure: Angular SiC grains in a continuous free-silicon matrix

Description

Reaction-bonded silicon carbide (SiSiC) is produced by infiltrating molten silicon into a porous SiC/carbon preform. Distinct from sintered SiC — contains free silicon phase. Used in pump seals, kiln furniture, heat exchangers, burner nozzles. Preparation must account for the two-phase microstructure (very hard SiC + softer free silicon).

Mechanical Properties

Hardness: 2200 HV (SiC), ~1100 HV (Si)
Hardness Category: very hard
Tensile Strength: 250-400 MPa (flexural)

Physical Properties

Density: 3.05-3.15 g/cm³
Melting Point: ~2700 °C (SiC), Si melts 1414 °C

Material Characteristics

Work Hardening: No
Magnetic: No
Corrosion Resistance: excellent

Sectioning

Diamond wafering blade - medium grit / low concentration. Diamond tooling required.

Mounting

Castable with epoxy or acrylic.

Grinding

Diamond grinding discs (NOT SiC paper — material IS SiC). 70μm diamond disc (planar), 30μm diamond on CERMESH (5 min).
Recommended Sequence:
70μm diamond30μm diamond

Polishing

6μm diamond on TEXPAN with SIAMAT (5 min), 1μm diamond on GOLDPAD/ATLANTIS with SIAMAT (5 min), SIAMAT colloidal silica on TEXPAN (5 min).
Recommended Sequence:
6μm diamond1μm diamond0.05μm colloidal silica

Etching

Best examined as-polished — SiC (dark) and Si (bright) clearly visible in BF. DIC enhances contrast. Murakami's reagent (KOH + K₃Fe(CN)₆) selectively attacks SiC grains. Dilute HF (10%) etches the free silicon phase. Molten KOH at elevated temperature attacks both phases.
Common Etchants:
As-polished (BF/DIC)Molten KOHMurakami's Reagent

Heat Treatment

Not heat treated. Manufactured by silicon infiltration at ~1500-1600°C.

Applicable Standards

  • ASTM C1161
  • ASTM C1327
  • DIN EN 60672-3

Applications

  • Pump seals and bearings
  • Kiln furniture
  • Heat exchangers
  • Burner nozzles

Typical Uses

  • Chemical pump mechanical seals
  • Roller kilns
  • Radiant heating tubes
  • Ballistic armor
  • Semiconductor processing