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PACE Technologies Metallographic Preparation CLASS Chart icon

Periclase Mineral
Specimen Preparation (Class 11 Procedures)
Metallographic Class 11 sample preparation  

The microstructural preparation of hard minerals requires correctly cutting and initial grinding of the sample; followed by rough polishing and polishing which minimizes damage. The use of polycrystalline diamond on low napped polishing pads effectively reduces the damage to the specimen; which can easily be removed by final polishing with colloidal silica.

Proper microstructural preparation requires minimizing fracturing and damage during cutting and initial grinding. The use of colloidal silica as a CMP polishing lubricant and abrasive significantly improves the surface finish for this class of materials.

SECTIONING
Diamond Wafering blade - medium grit / low concentration

MOUNTING
Castable Mounting with Epoxy or Acrylic resins.

POLISHING
Abrasive/surface Lubricant Force/ sample Speed
(Head/base)
Time Individual
Force mode
Central Force
mode
70 micron diamond grinding disk*
Water 5-10 lbs 200/200 rpm Planar
  Metallographic central polishing force
30 um DIAMAT diamond
suspension on CERMESH
Metal Mesh cloth
  5-10 lbs 200/200 rpm 5 min Metallographic individual polishing force Metallographic central polishing force
6 um DIAMAT diamond
on TEXPAN polishing pad
SIAMAT
colloidal silica
10 lbs 200/200 rpm 5 min Metallographic individual polishing force Metallographic central polishing force
1 um DIAMAT diamond
on GOLDPAD or ATLANTIS
polishing pad
SIAMAT
colloidal silica
10 lbs 200/200 rpm 5 min Metallographic individual polishing force Metallographic central polishing force
SIAMAT Colloidal silca
on TEXPAN polishing pad
  10 lbs 200/200 rpm 5 min Metallographic individual polishing force Metallographic central polishing force

*Required for central polishing force. Click here for more information on central vs. individual polishing force polishing.

Metallographic micrograph for Periclase Mineral
Periclase, 200X (B.F.) Theraml etching at 1200 Celcius
for 2 hours

Common Etchants
PACE Technologies Recommended Etchants

PACE Technologies Etchant Database

CAUTION:Safety is very important when etching. Be sure to wear the appropriate protective clothing and observe all WARNINGS on chemical manufacuters SDS (Safety Data Sheets). Also review the COMMENTS and CONDITIONS Section for each etchant.


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